Product Overview
ME-1515 is a water-soluble dry film photoresist specially developed for ITO applications. It offers strong adhesion, high resolution, excellent photosensitivity, and easy processing, supporting precise pattern formation and consistent imaging performance in ITO manufacturing processes. Its water-soluble development system enables efficient and clean processing.
Technical Specifications
| Properties | Parameters |
|---|---|
| Thickness | 15um |
| Exposure Energy(SST=7/21) | 60mJ/cm2 |
| Sensitivity (21ST) | 6土1 |
| Resolution(SST=6/21) | 20um |
| Adhesion(SST=6/21) | 25um |
| Stripping Time (3%NaOH, 50° C) | 15s |
Key Features
High Resolution
Supports precise pattern formation for ITO circuits and fine-feature applications.
Excellent Photosensitivity
Provides consistent exposure performance for accurate image transfer and stable pattern definition.
Strong Adhesion
Provides good adhesion to ITO-coated substrates, helping maintain pattern integrity during processing.
Easy Processing
Designed for efficient lamination, exposure, and development processes in ITO manufacturing.
Water-Soluble Development
Uses a water-soluble development system to support efficient and clean processing.